MatWorld
BETA
DashboardMaterials & SearchMaterial SelectorCompareExportsPricing

Semiconductors

23,839 materials

Plot 23,839 on Selector
AllMetalsPolymersCeramicsCompositesSemiconductorsShape Memory
AllMeasuredPublishedVerified

Al14 Tb2 Au6

semiconductorAl14 Tb2 Au6

Al14Tb2Au6 is an intermetallic compound combining aluminum, terbium (a rare-earth element), and gold. This material represents an experimental research composition rather than an established commercial alloy, likely studied for its potential in advanced applications where rare-earth strengthening and gold's chemical stability could offer unique property combinations. The material family falls within rare-earth intermetallics, a class of compounds explored primarily in academic and specialized industrial research for high-temperature performance, magnetic applications, or corrosion resistance in demanding environments.

rare-earth intermetallic researchhigh-temperature applicationscorrosion-resistant coatings
✓RoHS✓REACH✓Prop 65

Al16 Co7 Hf6

semiconductorAl16 Co7 Hf6

Al16Co7Hf6 is a complex intermetallic compound combining aluminum, cobalt, and hafnium, representing an experimental high-entropy or multi-principal-element alloy system. This material family is primarily of research interest for high-temperature structural applications where conventional superalloys may be limited, with potential applications in aerospace and extreme-environment engineering where exceptional thermal stability and strength retention are valued.

High-temperature structural applicationsAerospace engine components (research phase)Refractory alloy development
✓RoHS✓REACH✓Prop 65

Al16 Co7 Zr6

semiconductorAl16 Co7 Zr6

Al₁₆Co₇Zr₆ is an intermetallic compound combining aluminum, cobalt, and zirconium—a research-phase material exploring the properties of complex metallic alloys (CMAs) and high-entropy-type systems. This composition lies at the intersection of lightweight aluminum metallurgy and the thermal stability offered by refractory elements like zirconium and cobalt, making it of interest for high-temperature structural applications where conventional alloys reach their limits. While not yet widely commercialized, materials in this family are being investigated for aerospace, automotive, and thermal barrier contexts where superior creep resistance and reduced density compared to nickel-based superalloys could provide engineering advantages.

high-temperature structural componentsaerospace engine researchintermetallic compound development
✓RoHS✓REACH✓Prop 65

Al16 Cr10

semiconductorAl16 Cr10

Al16Cr10 is an intermetallic compound combining aluminum and chromium in a 16:10 atomic ratio, belonging to the family of Al-Cr binary intermetallics. This material is primarily of research interest rather than established production use, with potential applications in high-temperature structural applications and wear-resistant coatings where the hardness and oxidation resistance of chromium can be leveraged through aluminum's lighter weight. Engineers would consider this material family when seeking alternatives to conventional aluminum alloys in demanding thermal or abrasive environments, though development and manufacturing maturity remain limited compared to commercial Al alloys or well-established intermetallics.

high-temperature structural componentswear-resistant coatingsoxidation-resistant applications
✓RoHS✓REACH✓Prop 65

Al16 Hf6 Pd7

semiconductorAl16 Hf6 Pd7

Al16Hf6Pd7 is a multi-component intermetallic compound combining aluminum, hafnium, and palladium, representing an experimental high-entropy or complex alloy system rather than a commercially established material. This composition falls within research into advanced intermetallics and refractory alloy families, where hafnium and palladium additions to aluminum aim to achieve elevated-temperature strength, oxidation resistance, or enhanced mechanical properties beyond conventional aluminum alloys. Limited industrial deployment exists; the material is primarily of interest to materials researchers exploring next-generation structural alloys for extreme environments, though such ternary systems remain largely in the development phase and are not yet standardized for mainstream engineering applications.

research & developmenthigh-temperature structural alloysrefractory intermetallics
✓RoHS✓REACH✓Prop 65

Al16 Ni7 Sc6

semiconductorAl16 Ni7 Sc6

Al16Ni7Sc6 is an intermetallic compound combining aluminum, nickel, and scandium—a research-phase material belonging to the family of lightweight, high-strength intermetallics. This ternary system is primarily of academic and exploratory industrial interest, developed to investigate how scandium addition affects phase stability, creep resistance, and elevated-temperature performance in aluminum-nickel systems. The material remains largely experimental rather than widely commercialized, but represents the broader push toward scandium-containing aerospace and engine alloys that offer improved thermal stability and reduced density compared to conventional superalloys.

aerospace researchhigh-temperature structural applicationslightweight intermetallic development
✓RoHS✓REACH✓Prop 65

Al16 Os7 Sc6

semiconductorAl16 Os7 Sc6

Al₁₆Os₇Sc₆ is an intermetallic compound combining aluminum, osmium, and scandium—a research-phase material belonging to the family of complex metallic alloys (CMAs) or high-entropy intermetallics. This ternary system remains largely in the experimental literature stage, with potential interest in high-temperature structural applications and specialized electronic or catalytic contexts where osmium's refractory properties and scandium's lightweight alloying effects could be leveraged. Engineers would consider materials in this family only for advanced aerospace, catalysis, or fundamental materials research where conventional alloys prove insufficient and custom intermetallic phases justify the cost and complexity.

experimental high-temperature alloysrefractory intermetallic researchaerospace advanced materials
✓RoHS✓REACH✓Prop 65

Al16 Os7 Zr6

semiconductorAl16 Os7 Zr6

Al₁₆Os₇Zr₆ is an intermetallic compound combining aluminum, osmium, and zirconium—a research-phase material representing the family of high-entropy and multi-component refractory intermetallics. This compound is not yet established in mainstream commercial production; it is primarily of interest in advanced materials research exploring lightweight-refractory combinations and high-temperature structural applications where conventional superalloys or titanium aluminides reach performance limits. The osmium addition provides density and refractory character, while aluminum and zirconium contribute to lower density and potential oxidation resistance; engineers would consider such compositions only in specialized contexts where experimental performance data justifies development risk.

experimental high-temperature alloysaerospace propulsion researchrefractory intermetallic development
✓RoHS✓REACH✓Prop 65

Al16 Pd7 Ti6

semiconductorAl16 Pd7 Ti6

Al16Pd7Ti6 is an intermetallic compound combining aluminum, palladium, and titanium, belonging to the family of ternary metallic phases that form ordered crystal structures. This material is primarily of research interest in materials science and metallurgy, explored for its potential in high-temperature applications and structural materials where intermetallic phases offer improved strength-to-weight ratios and thermal stability compared to conventional alloys.

High-temperature structural applicationsAerospace research materialsIntermetallic phase studies
✓RoHS✓REACH✓Prop 65

Al16 Pt7 Zr6

semiconductorAl16 Pt7 Zr6

Al16Pt7Zr6 is an intermetallic compound combining aluminum, platinum, and zirconium—a research-phase material that belongs to the family of high-temperature intermetallic alloys. This ternary system is primarily explored for its potential in extreme-environment applications where conventional superalloys reach their limits, though it remains largely experimental and not widely deployed in production. Engineers considering this material would be evaluating it for niche aerospace or power-generation contexts where the combination of lightweight aluminum and refractory platinum and zirconium elements might offer thermal stability or oxidation resistance advantages over current alternatives.

high-temperature aerospace componentsexperimental intermetallic researchoxidation-resistant coatings
✓RoHS✓REACH✓Prop 65

Al16 Rh7 Ti6

semiconductorAl16 Rh7 Ti6

Al16Rh7Ti6 is an intermetallic compound combining aluminum, rhodium, and titanium, likely belonging to the family of high-temperature intermetallics or advanced aluminum alloys. This appears to be a research or developmental material rather than an established commercial alloy, potentially explored for applications requiring thermal stability and lightweight properties.

High-temperature structural applicationsAerospace researchIntermetallic research materials
✓RoHS✓REACH✓Prop 65

Al16 Rh7 Zr6

semiconductorAl16 Rh7 Zr6

Al16Rh7Zr6 is an experimental intermetallic compound combining aluminum, rhodium, and zirconium, belonging to the family of multi-component metallic systems investigated for high-temperature and advanced structural applications. This material remains largely in the research phase, with potential interest in aerospace and refractory applications due to the thermal stability conferred by rhodium and zirconium additions to an aluminum matrix. Compared to conventional aluminum alloys, intermetallic compounds of this type offer the promise of improved high-temperature strength and oxidation resistance, though manufacturability and cost considerations typically limit current adoption to specialized research and development contexts.

aerospace researchhigh-temperature structural componentsrefractory materials development
✓RoHS✓REACH✓Prop 65

Al16 Ru7 Sc6

semiconductorAl16 Ru7 Sc6

Al16Ru7Sc6 is an experimental intermetallic compound combining aluminum, ruthenium, and scandium—a research-stage material rather than an established commercial alloy. This composition falls within the family of high-entropy and complex intermetallic systems being investigated for applications requiring exceptional strength-to-weight ratios, high-temperature stability, or specialized electronic properties. The material remains largely in academic development; engineers would encounter it primarily in literature exploring advanced aerospace alloys, high-temperature structural applications, or semiconductor research rather than in production engineering.

aerospace research applicationshigh-temperature intermetallicslightweight structural composites (experimental)
✓RoHS✓REACH✓Prop 65

Al16 S32 Ca8

semiconductorAl16 S32 Ca8

Al16S32Ca8 is an experimental compound combining aluminum, sulfur, and calcium in a fixed stoichiometric ratio, classified as a semiconductor material. While not yet established in conventional industrial production, this composition belongs to the family of multinary chalcogenide semiconductors, which are of research interest for optoelectronic and photovoltaic applications due to their tunable bandgap and potential earth-abundant character compared to conventional III-V or II-VI semiconductors.

experimental photovoltaic researchthin-film solar cellsoptoelectronic devices
✓RoHS✓REACH✓Prop 65

Al16 S32 Sr8

semiconductorAl16 S32 Sr8

Al16S32Sr8 is an intermetallic compound combining aluminum, sulfur, and strontium elements, representing an experimental material in the intermediate sulfide/intermetallic family rather than a conventional alloy or semiconductor. This composition has not yet achieved widespread industrial adoption and appears primarily in materials research focused on exploring new phase diagrams and potential functional properties in mixed-cation ceramic-metallic systems. Interest in such compounds typically centers on niche applications where unusual electronic, thermal, or structural properties might emerge from the specific crystal structure—though practical engineering use remains limited pending further characterization and process development.

research and developmentphase diagram explorationfunctional ceramics research
✓RoHS✓REACH✓Prop 65

Al16 Te24

semiconductorAl16 Te24

Al16Te24 is a compound semiconductor composed of aluminum and tellurium in a specific stoichiometric ratio, belonging to the family of III-VI semiconductors. This material is primarily of research and development interest for optoelectronic and thermoelectric applications, where its direct bandgap and thermal properties could enable infrared detection, solid-state cooling, or power generation devices. While not yet widely deployed in mainstream industrial production, Al16Te24 and related aluminum telluride compounds represent promising candidates for specialized applications where conventional semiconductors (Si, GaAs, InSb) face limitations in operating temperature range or wavelength sensitivity.

infrared photodetectorsthermoelectric cooling devicesresearch optoelectronics
✓RoHS✓REACH✓Prop 65

Al18 Co4

semiconductorAl18 Co4

Al18Co4 is an intermetallic compound combining aluminum and cobalt, representing a research-phase material in the aluminum-cobalt binary system. This material family is primarily investigated for high-temperature structural applications and potential aerospace or automotive uses where lightweight strength combined with thermal stability is desirable. As an experimental compound, Al18Co4 exemplifies the broader intermetallic research space seeking alternatives to conventional alloys, though commercial adoption remains limited pending further development of manufacturing and processing routes.

high-temperature structural researchintermetallic compound developmentlightweight aerospace applications
✓RoHS✓REACH✓Prop 65

Al1 Ag1 B1

semiconductorAl1 Ag1 B1

Al1Ag1B1 is an experimental ternary intermetallic compound combining aluminum, silver, and boron in an equiatomic or near-equiatomic ratio, classified as a semiconductor material. This compound belongs to the family of advanced intermetallics and is primarily of research interest rather than established industrial production, with potential applications in high-temperature electronics, optoelectronics, or thermoelectric devices where the unique electronic properties arising from the aluminum-silver-boron combination could offer advantages over conventional semiconductors. The inclusion of silver—a high-conductivity, noble element—suggests investigation into hybrid electronic or photonic behavior, though practical deployment would depend on demonstrating reproducible synthesis, phase stability, and cost-effectiveness relative to mature semiconductor alternatives.

experimental semiconductor researchhigh-temperature electronicsoptoelectronic devices
✓RoHS✓REACH✓Prop 65

Al1 Ag1 O3

semiconductorAl1 Ag1 O3

Al₁Ag₁O₃ is an experimental mixed-metal oxide semiconductor combining aluminum and silver oxides in a 1:1:3 stoichiometric ratio. This compound belongs to the family of ternary oxides and has been explored in research contexts for optoelectronic and photocatalytic applications, where the combination of aluminum and silver oxide phases may offer enhanced charge carrier dynamics or catalytic activity compared to single-phase alternatives.

photocatalytic water treatmentoptoelectronic devicesresearch semiconductors
✓RoHS✓REACH✓Prop 65

Al1 Ag1 S2

semiconductorAl1 Ag1 S2

Al₁Ag₁S₂ is a ternary semiconductor compound combining aluminum, silver, and sulfur elements. This material belongs to the family of mixed-metal sulfides and is primarily of research interest for optoelectronic and photovoltaic applications, where the combination of these elements offers potential for tunable electronic properties and light-responsive behavior. While not yet widely established in mainstream industrial production, compounds of this type are being investigated for next-generation thin-film solar cells, photodetectors, and other semiconductor device applications where silver and aluminum sulfides' complementary properties may enable improved performance or novel functionality.

photovoltaic researchoptoelectronic devicesthin-film semiconductors
✓RoHS✓REACH✓Prop 65

Al1 As1

semiconductorAl1 As1

Aluminum arsenide (AlAs) is a III-V semiconductor compound commonly used in optoelectronic and high-frequency electronic devices. It serves as a key material in heterojunction structures, quantum wells, and integrated circuits where its direct bandgap and lattice-matching properties with gallium arsenide (GaAs) enable precise control of electron transport and light emission. AlAs is notable for its role in advancing microelectronics and photonics, particularly in applications requiring high electron mobility and thermal stability at elevated temperatures.

optoelectronic deviceshigh-frequency transistorsquantum well structures
✓RoHS✓REACH✓Prop 65

Al1 As1 Pt5

semiconductorAl1 As1 Pt5

Al₁As₁Pt₅ is an intermetallic compound combining aluminum, arsenic, and platinum in a 1:1:5 stoichiometric ratio. This is a research-phase material within the metal-semiconductor-metal (MSM) and intermetallic compound family, not yet established in mainstream engineering applications. The platinum-rich composition and inclusion of arsenic suggest potential interest in high-temperature electronics, thermoelectric devices, or specialized semiconductor contacts, though this specific compound remains primarily in materials science exploration rather than production use.

experimental semiconductorshigh-temperature electronics researchthermoelectric device development
✓RoHS✓REACH✓Prop 65

Al1 Au1

semiconductorAl1 Au1

Al1Au1 is an intermetallic compound combining aluminum and gold in equiatomic proportions, classified as a semiconductor material. This compound belongs to the family of metallic intermetallics and represents a research-phase material rather than a commercial product, with potential applications in advanced electronics and thermoelectric devices. The material is notable for combining the lightweight and abundance of aluminum with gold's excellent electrical and thermal conductivity, making it of interest to researchers exploring high-performance electronic and photonic applications.

thermoelectric devicesoptoelectronic researchsemiconductor contacts
✓RoHS✓REACH✓Prop 65

Al1 B1 N2

semiconductorAl1 B1 N2

AlBN₂ is an aluminum boron nitride compound belonging to the III-V semiconductor family, combining aluminum with boron nitride constituents to create a wide-bandgap semiconductor material. This composition is primarily investigated in research and advanced materials development for high-temperature and high-power electronic applications, offering potential advantages over conventional semiconductors due to its thermal stability and electrical properties. The material is notable for potential use in next-generation power electronics and RF devices where conventional silicon or GaAs semiconductors reach performance limits.

wide-bandgap semiconductorshigh-temperature electronicspower device research
✓RoHS✓REACH✓Prop 65

Al1 B2

semiconductorAl1 B2

AlB₂ is an intermetallic compound belonging to the aluminum-boron system, classified as a semiconductor with a hexagonal crystal structure. It is primarily of interest in advanced materials research and specialized high-temperature applications, where its combination of moderate stiffness and thermal stability makes it a candidate for composite reinforcement and electronic device development. AlB₂ remains largely exploratory compared to established semiconductors, but represents part of a broader research effort into boride-based materials for extreme environment and next-generation electronics applications.

composite reinforcement particleshigh-temperature ceramics researchsemiconductor device development
✓RoHS✓REACH✓Prop 65

Al1 B2 Pb1

semiconductorAl1 B2 Pb1

Al₁B₂Pb₁ is an intermetallic compound combining aluminum, boron, and lead in a 1:2:1 stoichiometric ratio. This is a research-phase material within the broader family of ternary intermetallics, studied primarily for potential electronic and structural applications where the specific combination of light aluminum and heavy lead may offer unusual property combinations. Industrial adoption remains limited; the material is encountered mainly in materials research contexts exploring phase diagrams, electronic structure, or specialized alloy development rather than in established production applications.

experimental intermetallic researchphase diagram studieselectronic material development
✓RoHS✓REACH✓Prop 65

Al1 B3 N4

semiconductorAl1 B3 N4

Al₁B₃N₄ is an advanced ceramic semiconductor compound combining aluminum, boron, and nitrogen—a material family known for exceptional hardness and thermal stability. While not yet widely commercialized as a bulk engineering material, compounds in this ternary system are of strong research interest for high-temperature and high-power electronic applications, offering potential advantages over traditional semiconductors in extreme environments where thermal and chemical resistance are critical.

high-temperature electronicswide-bandgap semiconductorsthermal barrier coatings
✓RoHS✓REACH✓Prop 65

Al1 Bi1

semiconductorAl1 Bi1

Al1Bi1 is an intermetallic compound combining aluminum and bismuth in a 1:1 stoichiometric ratio, classified as a semiconductor material. This compound belongs to the III-V intermetallic family and is primarily of research interest rather than established industrial production. The material shows potential in thermoelectric applications and advanced semiconductor device research due to bismuth's unique electronic properties, though practical engineering applications remain limited and the material is typically explored in laboratory settings for fundamental studies in condensed matter physics and materials science.

thermoelectric researchexperimental semiconductorscondensed matter physics
✓RoHS✓REACH✓Prop 65

Al1 Bi1 O3

semiconductorAl1 Bi1 O3

Al₁Bi₁O₃ is a bismuth-aluminum oxide semiconductor compound that combines metallic bismuth with aluminum oxide in a 1:1:3 stoichiometry. This is an experimental or niche research material rather than an established commercial compound; it belongs to the broader family of mixed-metal oxides being investigated for optoelectronic and photocatalytic applications. Engineers considering this material should recognize it as primarily of research interest, potentially useful in visible-light photocatalysis, thin-film semiconductors, or specialized optoelectronic devices where bismuth's narrow bandgap and aluminum oxide's chemical stability can be leveraged together.

photocatalysis researchvisible-light semiconductor applicationsthin-film optoelectronics
✓RoHS✓REACH✓Prop 65

Al1 Bi3 O9

semiconductorAl1 Bi3 O9

Al₁Bi₃O₉ is a ternary oxide semiconductor compound combining aluminum and bismuth in a crystalline structure. This material belongs to the bismuth oxide family of semiconductors, which are of interest in photocatalysis, optoelectronics, and solid-state device research, though Al₁Bi₃O₉ itself remains primarily a research-phase compound rather than a mature industrial material. The bismuth oxide family is valued for visible-light activity and band-gap tunability, making it a candidate for next-generation photocatalytic and sensing applications where conventional wide-band-gap semiconductors prove inefficient.

photocatalytic water treatmentvisible-light sensorsthin-film optoelectronics
✓RoHS✓REACH✓Prop 65

Al1 Cl3

semiconductorAl1 Cl3

Aluminum trichloride (AlCl₃) is a Lewis acidic inorganic compound classified as a semiconductor material in this database context, though it is more commonly recognized as a versatile chemical reagent rather than a traditional semiconducting material. Industrial applications include catalysis in organic synthesis (Friedel-Crafts reactions), aluminum production processes, and specialized coatings; it is valued for its strong acidic character and ability to form complexes. Engineers select AlCl₃ primarily for chemical processing and catalytic applications rather than for electronic or structural properties, making it relevant in chemical engineering and process development rather than conventional materials selection for mechanical or electronic components.

catalytic processingorganic synthesisaluminum refining
✓RoHS✓REACH✓Prop 65

Al1 Co1

semiconductorAl1 Co1

Al₁Co₁ is an intermetallic compound combining aluminum and cobalt in equiatomic proportions, belonging to the semiconductor class of materials. This compound is primarily of research and development interest rather than established industrial production, with potential applications in high-temperature structural materials and advanced electronics where the combination of aluminum's light weight and cobalt's magnetic and strengthening properties could be exploited.

research intermetallicshigh-temperature materials developmentmagnetic alloy systems
✓RoHS✓REACH✓Prop 65

Al1 Co1 F5

semiconductorAl1 Co1 F5

Al1Co1F5 is an intermetallic compound combining aluminum, cobalt, and fluorine, classified as a semiconductor material with potential applications in emerging electronic and photonic device research. This composition represents an experimental or specialized compound rather than a widely commercialized material; compounds in this family are primarily of interest for fundamental studies of electronic properties, potential catalytic activity, or advanced functional coatings. Engineers would consider this material for cutting-edge research contexts where the unique combination of metallic and fluorine elements offers specific electronic, thermal, or chemical functionalities not available in conventional alloys or semiconductors.

research semiconductorsadvanced electronicsexperimental catalytic coatings
✓RoHS✓REACH✓Prop 65

Al1 Co1 O3

semiconductorAl1 Co1 O3

Al₁Co₁O₃ is an oxide semiconductor compound in the ternary alumina-cobalt system, likely in the research or development phase rather than established commercial production. This material combines aluminum and cobalt oxides and is investigated for potential applications leveraging cobalt's magnetic and catalytic properties alongside alumina's mechanical strength and chemical stability. The compound represents an emerging area in functional ceramics where researchers explore enhanced electrical, magnetic, or catalytic performance for specialized industrial processes.

catalysis researchmagnetic semiconductor deviceshigh-temperature ceramics
✓RoHS✓REACH✓Prop 65

Al1 Co2 Nb1

semiconductorAl1 Co2 Nb1

Al₁Co₂Nb₁ is an intermetallic compound combining aluminum, cobalt, and niobium in a defined stoichiometric ratio. This material belongs to the family of multi-component intermetallics that exhibit semiconductor properties, making it a research-stage compound rather than an established industrial material. The cobalt-niobium backbone with aluminum substitution positions this compound within the broader field of high-temperature intermetallics and functional materials, where it may offer potential for electronic or thermoelectric applications where both structural integrity and electronic behavior are relevant.

thermoelectric devices (research)high-temperature structural semiconductorsadvanced intermetallic research
✓RoHS✓REACH✓Prop 65

Al1 Co2 Pr2

semiconductorAl1 Co2 Pr2

Al₁Co₂Pr₂ is an intermetallic compound combining aluminum, cobalt, and praseodymium—a rare-earth transition metal system designed to explore novel electronic and magnetic properties at the intersection of 3d and 4f electron systems. This material is primarily a research compound rather than an established industrial material; it belongs to the broader family of rare-earth intermetallics being investigated for potential applications in permanent magnets, thermoelectric devices, and advanced electronic materials where the coupling between cobalt magnetism and praseodymium's strong spin-orbit coupling could yield useful functional properties.

research and developmentpermanent magnet systemsthermoelectric materials
✓RoHS✓REACH✓Prop 65

Al1 Co2 Si1

semiconductorAl1 Co2 Si1

Al₁Co₂Si₁ is an intermetallic compound combining aluminum, cobalt, and silicon in a defined stoichiometric ratio, belonging to the class of ternary intermetallics. This material is primarily of research and development interest rather than widely commercialized; it represents exploration within the aluminum-cobalt-silicon system for potential high-temperature structural applications, magnetic properties, or wear-resistant coatings. The cobalt-silicon framework combined with aluminum offers potential advantages in specific high-performance environments, though direct industrial adoption remains limited compared to more established intermetallic families like nickel aluminides or titanium aluminides.

experimental intermetallicshigh-temperature researchwear-resistant coatings
✓RoHS✓REACH✓Prop 65

Al1 Co2 Si2

semiconductorAl1 Co2 Si2

Al1Co2Si2 is an intermetallic compound combining aluminum, cobalt, and silicon—a research-phase material belonging to the ternary intermetallic family rather than a widely commercialized alloy. This compound is primarily of academic and advanced materials interest, investigated for potential applications in high-temperature structural materials, magnetic devices, and semiconductor applications where the unique phase stability and electronic properties of aluminum-transition metal silicides are leveraged. Engineers would consider this material for exploratory projects requiring lightweight, thermally stable intermetallics in extreme environments, though it remains in the experimental stage with limited industrial adoption compared to established superalloys or conventional semiconductors.

high-temperature intermetallics researchmagnetic materials developmentadvanced semiconductor compounds
✓RoHS✓REACH✓Prop 65

Al1 Co2 Ta1

semiconductorAl1 Co2 Ta1

Al₁Co₂Ta₁ is an intermetallic compound combining aluminum, cobalt, and tantalum—a research-phase material exploring high-performance alloy systems for extreme environments. This ternary composition sits at the intersection of lightweight aluminum metallurgy and refractory metal strengthening, targeting applications where conventional superalloys face cost or weight penalties. The material remains largely experimental; its potential lies in aerospace and high-temperature structural applications where cobalt and tantalum provide hardening and thermal stability while aluminum reduces density.

aerospace structureshigh-temperature alloysintermetallic compounds
✓RoHS✓REACH✓Prop 65

Al1 Co2 Zr1

semiconductorAl1 Co2 Zr1

Al₁Co₂Zr₁ is an intermetallic compound combining aluminum, cobalt, and zirconium in a defined stoichiometric ratio. This is a research-phase material primarily of interest in materials science rather than established industrial production; intermetallic compounds of this type are investigated for potential applications requiring high-temperature stability, hardness, or electronic properties that conventional alloys cannot deliver.

high-temperature structural applicationswear-resistant coatingsaerospace research
✓RoHS✓REACH✓Prop 65

Al1 Co3

semiconductorAl1 Co3

Al1Co3 is an intermetallic compound in the aluminum-cobalt system, classified as a semiconductor with ordered crystal structure. This material is primarily of research and development interest rather than established commercial production, studied for potential applications in high-temperature structural applications and electronic devices where intermetallic phases can offer improved strength and thermal stability compared to conventional aluminum alloys. The aluminum-cobalt intermetallic family represents an emerging materials class with potential for aerospace and automotive applications, though practical adoption remains limited pending further development and scalability.

High-temperature structural compoundsIntermetallic research materialsSemiconductor device research
✓RoHS✓REACH✓Prop 65

Al1 Co3 C1

semiconductorAl1 Co3 C1

Al₁Co₃C₁ is an intermetallic carbide compound combining aluminum, cobalt, and carbon, classified as a semiconductor material. This is a research-phase compound rather than a widely commercialized alloy; it belongs to the family of ternary carbides and intermetallics that are of interest for high-temperature structural applications and electronic device research. The combination of light aluminum with cobalt's strength and carbon's hardening effects suggests potential for wear resistance and thermal stability, though practical engineering use remains limited and largely confined to materials science research.

research phase intermetallichigh-temperature materials developmentsemiconductor research
✓RoHS✓REACH✓Prop 65

Al1 Cr1 Co2

semiconductorAl1 Cr1 Co2

Al₁Cr₁Co₂ is an intermetallic compound combining aluminum, chromium, and cobalt in a defined stoichiometric ratio, classified as a semiconductor material. This composition represents a research-phase complex intermetallic alloy, likely investigated for high-temperature structural applications or functional semiconductor properties where the combination of refractory elements (Cr, Co) with lightweight aluminum offers potential for improved strength-to-weight ratios and thermal stability. The material's semiconductor character suggests potential applications in thermoelectric devices, magnetic materials research, or advanced electronic applications rather than traditional load-bearing structural use.

high-temperature intermetallic researchthermoelectric materials developmentadvanced alloy experimentation
✓RoHS✓REACH✓Prop 65

Al1 Cr1 Cu2

semiconductorAl1 Cr1 Cu2

Al1Cr1Cu2 is an aluminum-based intermetallic compound containing chromium and copper in a defined stoichiometric ratio, classified as a semiconductor material. This composition likely represents a research-phase or emerging intermetallic rather than an established commercial alloy, positioned within the family of aluminum transition-metal compounds that are studied for their potential combination of lightweight character with enhanced mechanical and electronic properties. Applications would be targeted at specialized sectors where semiconductor behavior, thermal management, or wear resistance at elevated temperatures are critical, though this particular composition remains largely exploratory in nature.

experimental intermetallic compoundsthermal management deviceswear-resistant coatings
✓RoHS✓REACH✓Prop 65

Al1 Cr1 F5

semiconductorAl1 Cr1 F5

Al₁Cr₁F₅ is a fluoride-based intermetallic compound combining aluminum and chromium with fluorine, classified as a semiconductor material. This composition represents a research-phase compound within the aluminum-chromium fluoride family, potentially of interest for specialized electronic or photonic applications where fluoride semiconductors offer wide bandgaps and high thermal stability. Material selection would depend on specific device requirements such as UV responsiveness, high-temperature operation, or chemical inertness, though this particular stoichiometry appears to be in early investigation rather than established industrial production.

semiconductor researchwide-bandgap deviceshigh-temperature electronics
✓RoHS✓REACH✓Prop 65

Al1 Cr1 Fe2

semiconductorAl1 Cr1 Fe2

Al₁Cr₁Fe₂ is an intermetallic compound combining aluminum, chromium, and iron in a fixed stoichiometric ratio, classified as a semiconductor material. This ternary system belongs to the family of transition metal aluminides, which are of significant research interest for high-temperature structural applications due to their potential for improved strength-to-weight ratios and oxidation resistance compared to conventional aluminum alloys. The specific phase Al₁Cr₁Fe₂ and its semiconductor classification suggest potential applications in thermoelectric devices, magnetoresistive sensors, or catalytic materials where the unique electronic structure arising from the intermetallic ordering provides functional properties beyond conventional structural use.

high-temperature intermetallic compoundsthermoelectric device researchtransition metal aluminide development
✓RoHS✓REACH✓Prop 65

Al1 Cr1 Ni2

semiconductorAl1 Cr1 Ni2

Al1Cr1Ni2 is an experimental intermetallic compound combining aluminum, chromium, and nickel in a 1:1:2 ratio, classified as a semiconductor material. This composition represents a complex metallic alloy system with potential applications in high-temperature structural or functional materials, though it remains largely in the research phase with limited industrial deployment. The material is notable within the aluminum-transition metal intermetallic family for its potential to combine moderate stiffness with thermal stability, making it of interest for applications requiring both mechanical integrity and electrical or catalytic properties.

high-temperature structural researchintermetallic compound developmentaerospace materials exploration
✓RoHS✓REACH✓Prop 65

Al1 Cr1 O3

semiconductorAl1 Cr1 O3

Al₁Cr₁O₃ is a chromium-aluminum oxide ceramic compound belonging to the mixed oxide family, likely synthesized for specialized functional applications. This material combines aluminum oxide's thermal stability with chromium's hardness and chemical resistance, positioning it as a candidate for high-temperature structural or electronic applications in research and emerging industrial contexts. Its semiconductor classification suggests potential use in thermal management, wear-resistant coatings, or advanced ceramic device applications where conventional alumina alone is insufficient.

high-temperature ceramicswear-resistant coatingssemiconductor substrates
✓RoHS✓REACH✓Prop 65

Al1 Cr1 O4

semiconductorAl1 Cr1 O4

Al₁Cr₁O₄ is a mixed-metal oxide ceramic compound combining aluminum and chromium oxides, belonging to the spinel or spinel-related oxide family. This material is primarily investigated in research contexts for high-temperature structural applications and as a potential candidate for refractory coatings and catalytic supports, where its thermal stability and mixed-valence metal chemistry offer advantages over single-component oxides. Engineers consider this compound for applications requiring combined thermal protection and chemical inertness, though it remains largely in development phase compared to established alternatives like alumina or chromia ceramics.

refractory coatingshigh-temperature ceramicscatalyst supports
✓RoHS✓REACH✓Prop 65

Al1 Cr1 Ru2

semiconductorAl1 Cr1 Ru2

Al1Cr1Ru2 is a ternary intermetallic compound combining aluminum, chromium, and ruthenium in a 1:1:2 stoichiometric ratio. This is a research-phase material within the family of refractory intermetallics, developed to explore novel high-temperature or corrosion-resistant applications where ruthenium's noble metal properties and chromium's oxidation resistance are leveraged with aluminum's lightweight potential. While not yet widely deployed in production, such ternary systems are of interest to the aerospace and materials research communities as candidates for extreme-environment structural applications or specialized functional coatings where conventional superalloys or ceramic composites may fall short.

High-temperature intermetallic researchRefractory compound developmentCorrosion-resistant coatings
✓RoHS✓REACH✓Prop 65

Al1 Cr1 W2 O8

semiconductorAl1 Cr1 W2 O8

Al₁Cr₁W₂O₈ is a complex mixed-metal oxide ceramic compound combining aluminum, chromium, and tungsten oxides, belonging to the broader family of refractory and functional ceramics. This material is primarily of research and developmental interest rather than established high-volume production, with potential applications in high-temperature structural applications, wear-resistant coatings, and electronic ceramics where the combination of multiple metal oxides provides enhanced thermal stability and mechanical performance compared to single-oxide alternatives.

High-temperature structural ceramicsRefractory materialsWear-resistant coatings
✓RoHS✓REACH✓Prop 65

Al1 Cr2

semiconductorAl1 Cr2

Al1Cr2 is an intermetallic compound in the aluminum-chromium system, classified as a semiconductor material with potential applications in advanced functional materials. While not a widely established commercial material, this composition lies within research interest for its potential in high-temperature structural applications and electronic device components, where the aluminum-chromium intermetallic family offers thermal stability and moderate mechanical properties. The material's semiconductor characteristics suggest relevance for thermoelectric or sensing applications where chromium-aluminum phases can provide functional properties distinct from conventional metals or ceramics.

intermetallic research compoundshigh-temperature structural materialsthermoelectric devices
✓RoHS✓REACH✓Prop 65

Al1 Cr3 B4

semiconductorAl1 Cr3 B4

Al₁Cr₃B₄ is an intermetallic compound combining aluminum, chromium, and boron—a ceramic-class material that belongs to the family of transition metal borides and aluminides. This is primarily a research-phase material studied for its potential in high-temperature structural applications, where the combination of light weight (aluminum) and refractory properties (chromium boride) could offer advantages over conventional superalloys. Development remains limited to laboratory and early-stage evaluation, as industrial deployment would depend on demonstrating superior thermal stability, oxidation resistance, and mechanical reliability compared to established alternatives like nickel superalloys or ceramic matrix composites.

high-temperature structural researchaerospace applications (experimental)refractory materials development
✓RoHS✓REACH✓Prop 65

Al1 Cu1

semiconductorAl1 Cu1

Al₁Cu₁ is an intermetallic compound in the aluminum-copper system, characterized by a 1:1 atomic ratio that produces a distinct crystal structure differing from conventional aluminum alloys. This material is primarily of research interest for understanding phase behavior and mechanical properties in the Al-Cu binary system; industrial applications remain limited due to brittleness and processing challenges compared to age-hardened aluminum alloys like 2024 or 7075. Engineers may encounter this compound in academic studies of precipitation hardening mechanisms or as a reference phase when optimizing copper-containing aluminum alloys for structural applications.

metallurgical researchphase diagram studiesintermetallic compound characterization
✓RoHS✓REACH✓Prop 65

Al1 Cu1 Au2

semiconductorAl1 Cu1 Au2

Al₁Cu₁Au₂ is an intermetallic compound combining aluminum, copper, and gold in a fixed stoichiometric ratio, representing a research-phase material in the aluminum-copper-gold ternary system. This composition falls within the broader class of precious-metal-containing intermetallics, which are typically investigated for high-temperature stability, wear resistance, or specialized electronic applications where gold's properties (conductivity, corrosion resistance, biocompatibility) can be leveraged alongside aluminum's light weight and copper's thermal/electrical characteristics. While not a commodity engineering material, intermetallics in this family are explored in aerospace, electronics, and biomedical research contexts where the cost of gold can be justified by performance or reliability demands in extreme or demanding environments.

research intermetallicshigh-temperature contactswear-resistant coatings
✓RoHS✓REACH✓Prop 65

Al1 Cu1 O2

semiconductorAl1 Cu1 O2

Al₁Cu₁O₂ is an intermetallic oxide semiconductor compound combining aluminum, copper, and oxygen in a 1:1:2 stoichiometry. This material belongs to the family of mixed-metal oxides and represents a research-phase compound rather than a widely commercialized engineering material; it is studied primarily for its semiconductor properties and potential electronic or photonic applications. The copper-aluminum oxide system is of interest in catalysis, thin-film electronics, and materials research where the combination of two transition metals with oxygen creates tunable electronic properties distinct from binary oxides like Al₂O₃ or CuO.

experimental semiconductorsthin-film electronics researchheterogeneous catalysis
✓RoHS✓REACH✓Prop 65

Al1 Cu1 O3

semiconductorAl1 Cu1 O3

Al₁Cu₁O₃ is a ternary oxide ceramic compound combining aluminum, copper, and oxygen in a 1:1:3 stoichiometric ratio. This material belongs to the semiconductor oxide family and is primarily of research interest rather than established industrial production; it may exhibit mixed-valence copper behavior and potential photocatalytic or electronic properties relevant to functional ceramic development.

photocatalytic applicationssemiconductor researchadvanced ceramics development
✓RoHS✓REACH✓Prop 65

Al1 Cu1 Pt2

semiconductorAl1 Cu1 Pt2

Al₁Cu₁Pt₂ is an intermetallic compound combining aluminum, copper, and platinum in a defined stoichiometric ratio, classified as a semiconductor. This material represents a research-phase compound within the broader family of ternary intermetallics, synthesized primarily for investigation of electronic and structural properties rather than established high-volume industrial production. The incorporation of platinum—a precious metal with high electronegativity and stability—alongside aluminum and copper suggests potential applications in electronics, catalysis, or specialized high-performance environments where chemical stability and electronic properties are critical.

experimental semiconductor researchintermetallic phase studiescatalytic coatings (research stage)
✓RoHS✓REACH✓Prop 65

Al1 Cu2 Hf1

semiconductorAl1 Cu2 Hf1

Al₁Cu₂Hf₁ is an intermetallic compound combining aluminum, copper, and hafnium—a research-phase material exploring the property space between lightweight aluminum alloys and refractory intermetallics. This composition targets enhanced strength and thermal stability by leveraging hafnium's high melting point and chemical affinity within a copper-rich matrix, making it primarily of academic and developmental interest rather than established industrial production. Potential applications lie in high-temperature aerospace structures, thermal barrier systems, or advanced composites where the material family's strength-to-weight ratio and oxidation resistance could compete against titanium aluminides or conventional superalloys, though maturity and cost-effectiveness remain open engineering questions.

high-temperature aerospace components (research stage)refractory intermetallic developmentthermal barrier coatings (exploratory)
✓RoHS✓REACH✓Prop 65

Al1 Cu2 Zr1

semiconductorAl1 Cu2 Zr1

Al₁Cu₂Zr₁ is an intermetallic compound combining aluminum, copper, and zirconium in a defined stoichiometric ratio. This material represents an experimental or research-phase composition within the Al-Cu-Zr ternary system, studied for potential structural and functional applications where the combination of lightweight aluminum and the strengthening/stabilizing effects of copper and zirconium additions may offer advantages in high-temperature performance or mechanical properties. Such ternary intermetallics are of particular interest in advanced aerospace and energy sectors where conventional Al-Cu binary systems reach performance limits, though industrial adoption remains limited pending full characterization and processing optimization.

High-temperature structural applicationsAerospace research and developmentIntermetallic matrix composites
✓RoHS✓REACH✓Prop 65
PreviousPage 7 of 398 (23,839 materials)Next