TaCl5

ceramic
· TaCl5

Tantalum pentachloride (TaCl5) is a halide ceramic precursor compound primarily used as a volatile source material rather than a final structural ceramic. In industry, it serves as a starting reagent for chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to synthesize tantalum oxide coatings and thin films, leveraging its high reactivity and vaporization characteristics. Engineers select TaCl5 over alternative tantalum precursors when precise, conformal thin-film deposition is required on complex geometries, particularly in semiconductor fabrication and protective coating applications.

CVD/ALD precursorSemiconductor thin filmsTantalum oxide coatingsMicroelectronics manufacturingCorrosion-resistant coatingsHigh-temperature barrier layers

Compliance & Regulations

?Conflict Free?RoHS?REACH?TSCA?Prop 65
PropertyValueUnitConditionsSource
Density(ρ)
lb/in³
Verified Unverified Low confidence (<80%) Link to source
PropertyValueUnitConditionsSource
Band Gap(Eg)
eV
Magnetic Moment(μB)
µB
Seebeck Coefficient(S)
µV/K
Verified Unverified Low confidence (<80%) Link to source
PropertyValueUnitConditionsSource
Energy Above Hull(ΔEhull)
eV/atom
Formation Energy(ΔHf)2 entries
eV/atom
eV/atom
N entriesMultiple entries per property — large groups are collapsed; click a summary row to expand. Use filters above to narrow by form / heat treatment / basis.
Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.