Ta₁N₁ (tantalum nitride) is a ceramic compound semiconductor in the refractory transition metal nitride family, characterized by high hardness and thermal stability. It is primarily used in microelectronics as a diffusion barrier and adhesion layer in copper interconnect systems, as well as in hard coatings for wear-resistant applications; its chemical inertness and high melting point make it valuable where conventional barriers fail in advanced semiconductor processing. The material is also explored for emerging applications in superconductivity research and energy storage devices due to its metallic-ceramic hybrid properties.
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| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Bulk Modulus(K) | 50,068.6 | ksi | — | ||
Shear Modulus(G) | 35,280 | ksi | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.1935 | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -1.310 | eV/atom | — |