Hf8 O16

ceramic

· Hf8 O16

Hafnium oxide (HfO₂) is a high-performance ceramic compound valued for its exceptional thermal stability, high melting point, and excellent dielectric properties. This material finds critical use in advanced semiconductor manufacturing as a gate dielectric in modern transistors, as well as in thermal barrier coatings for aerospace applications where resistance to extreme temperatures is essential. Engineers select hafnium oxide over alternatives like silicon dioxide when superior thermal performance, higher dielectric constant, or enhanced chemical stability at elevated temperatures is required.

semiconductor gate dielectricsthermal barrier coatingshigh-temperature aerospace applicationsoptical coatingsrefractory materialsadvanced electronics

Compliance & Regulations

?Conflict Free?RoHS?REACH?TSCA?Prop 65

Units:

si imperial

Property	Value	Unit	Conditions	Source
Bulk Modulus(K)	34,137.1	ksi	—
Shear Modulus(G)	17,607.6	ksi	—

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Band Gap(Eg)	4.315	eV	—

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Formation Energy(ΔHf)	-3.798	eV/atom	—

Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.

Hf8 O16

Mechanical Properties

Electrical Properties

Other Properties

Regulatory Screening

Environmental