HfHgO₃ is an experimental ternary oxide semiconductor compound combining hafnium, mercury, and oxygen. This material belongs to the family of complex metal oxides and is primarily of research interest for its potential semiconductor properties, though industrial applications remain limited. Given the perovskite-like composition, this compound may be investigated for optoelectronic devices, photocatalysis, or solid-state applications where the combined properties of hafnium's high refractive index and chemical stability could offer advantages over conventional semiconductors.
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| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Bulk Modulus(K) | 24,105.3 | ksi | — | ||
Shear Modulus(G) | 8,972 | ksi | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.1965 | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -2.135 | eV/atom | — |