Ge₀.₇₇₄Si₀.₂₂₆ is a silicon-germanium alloy semiconductor with a germanium-rich composition, engineered to modulate bandgap and lattice properties relative to pure silicon or germanium. This material is primarily developed for advanced optoelectronic and high-speed electronic devices where the intermediate bandgap of the SiGe system offers advantages over conventional semiconductors—particularly in infrared detection, heterojunction bipolar transistors (HBTs), and strained-layer heterostructures used in communications and imaging systems.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 1.500 | eV | — |