Ga₆N₂O₆ is a gallium oxynitride compound, representing a mixed-anion semiconductor that combines gallium nitride (GaN) characteristics with oxide components. This is primarily a research-phase material under investigation for wide-bandgap semiconductor applications, where the incorporation of oxygen into the GaN lattice may enable tuning of electronic and optical properties beyond conventional binary nitrides. Interest focuses on power electronics, optoelectronic devices, and high-temperature applications where engineered bandgap and carrier mobility are critical, though the material remains largely in development stages with limited industrial deployment.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 1.907 | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -1.555 | eV/atom | — |