ZrInO₂N is an experimental oxynitride semiconductor compound combining zirconium, indium, oxygen, and nitrogen elements. This material belongs to the family of transition metal oxynitrides, which are being actively researched for photocatalytic and optoelectronic applications due to their tunable bandgap and potential for visible-light activity. The incorporation of nitrogen into the zirconium-indium oxide lattice is designed to narrow the bandgap compared to conventional oxides, making it potentially useful in photocatalysis, photoelectrochemistry, and next-generation semiconductor devices.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.6000 | eV | DFT · GLLB-SC | ||
Magnetic Moment(μB) | -0.000417 | μB | DFT |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 1.040 | eV/atom | DFT |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data