YHfO2N
semiconductorYHfO2N is an experimental oxynitride ceramic compound combining yttrium, hafnium, oxygen, and nitrogen—belonging to the family of high-entropy or complex oxynitride ceramics under active research. This material class is investigated for extreme-environment applications where conventional oxides fall short, particularly in thermal barrier coatings, next-generation electronics, and high-temperature structural applications where enhanced thermal stability, oxidation resistance, and mechanical properties at elevated temperatures are critical. YHfO2N remains primarily a research compound; engineers would consider it when conventional hafnium oxides or yttria-stabilized zirconia are insufficient and when project timelines permit engagement with emerging materials.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | — | eV | — | — | |
Magnetic Moment(μB) | — | μB | — | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | — | eV/atom | — | — |