Tm₂Si₄Ni₂ is an intermetallic compound combining thulium (a rare-earth element), silicon, and nickel in a fixed stoichiometric ratio. This is a research-phase material studied primarily in solid-state chemistry and materials science; it is not yet established in mainstream industrial production. The rare-earth–transition-metal silicide family to which it belongs is of interest for potential high-temperature applications, electronic devices, and fundamental investigations into phase stability and crystal structures, though Tm₂Si₄Ni₂ itself remains largely experimental without widespread commercial adoption.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.00110 | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -0.7660 | eV/atom | — |