TlHfON2 is an experimental oxynitride ceramic compound combining thallium, hafnium, oxygen, and nitrogen. This material belongs to the family of advanced refractory oxynitrides, which are primarily investigated in research settings for high-temperature structural applications where conventional oxides reach their performance limits. The incorporation of nitrogen into hafnium-based ceramics is designed to improve hardness, thermal stability, and oxidation resistance compared to pure oxide counterparts, making it a candidate for extreme-environment engineering, though industrial adoption remains limited and material properties are still being characterized.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | DFT · GLLB-SC | ||
Magnetic Moment(μB) | -0.3844 | μB | DFT |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 1.180 | eV/atom | DFT |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data