Ti₄Si₄Rh₄ is an intermetallic compound combining titanium, silicon, and rhodium in a 1:1:1 molar ratio. This is a research-phase material within the titanium-based intermetallic family, where the addition of rhodium (a refractory noble metal) to titanium silicides is designed to enhance high-temperature stability, oxidation resistance, and potentially improve fracture toughness compared to conventional Ti–Si compounds. Applications remain primarily in academic and aerospace R&D contexts rather than established production use, targeting ultra-high-temperature structural applications where cost and processing complexity are secondary to thermal performance.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.00620 | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -0.9040 | eV/atom | — |