TeSiON2
semiconductorTeSiON2 is a tellurium-silicon oxynitride semiconductor compound that combines tellurium and silicon in an oxynitride matrix, creating a material with mixed-valent electronic properties. This composition positions it within the family of chalcogenide semiconductors and likely represents a research or specialized engineering material designed for optoelectronic or solid-state device applications where tunable band gaps and mixed oxidation states offer advantages over conventional binary semiconductors. The incorporation of nitrogen into a tellurium-silicon oxide lattice suggests potential applications in photovoltaics, infrared sensing, or high-temperature electronic devices where traditional materials face thermal or spectral limitations.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | — | eV | — | — | |
Magnetic Moment(μB) | — | μB | — | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | — | eV/atom | — | — |