TaSiOFN is an oxynitride ceramic compound combining tantalum, silicon, oxygen, and nitrogen phases, designed to achieve high-temperature structural performance and wear resistance. This material family is primarily explored in research and advanced industrial contexts where extreme thermal stability, oxidation resistance, and hardness are required simultaneously—particularly in aerospace, cutting tool applications, and thermal barrier coatings where conventional nitrides or oxides alone fall short. The oxynitride approach leverages the thermal stability of oxides with the hardness and chemical inertness of nitrides, making it a candidate for next-generation high-temperature composites and protective surfaces.
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| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | DFT · GLLB-SC | ||
Magnetic Moment(μB) | -2.055 | μB | DFT |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 1.620 | eV/atom | DFT |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data