TaSi is a tantalum silicide ceramic compound that combines tantalum and silicon to create a refractory material with high-temperature stability and oxidation resistance. It is primarily used in aerospace and semiconductor applications where extreme thermal environments and chemical resistance are critical, such as in thermal protection systems, high-temperature coatings, and specialized electronic components. TaSi is valued for its ability to maintain structural integrity at elevated temperatures where conventional metals would fail, making it an important material for next-generation thermal management and harsh-environment engineering.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Density(ρ) | 0.3966 | lb/in³ | DFT · OptB88vdW |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | DFT · OptB88vdW | ||
Magnetic Moment(μB) | 0.000 | µB | DFT · OptB88vdW |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Energy Above Hull(ΔEhull) | 0.4541 | eV/atom | DFT · OptB88vdW | ||
Formation Energy(ΔHf) | 0.01237 | eV/atom | DFT · OptB88vdW |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data