TaHfO2N is an experimental ceramic compound combining tantalum, hafnium, oxygen, and nitrogen—a refractory oxynitride designed for extreme-temperature and high-stress environments. This material belongs to the family of advanced ceramics that leverage the thermal stability and hardness of transition-metal oxynitrides, offering potential advantages over conventional refractory oxides in applications demanding resistance to thermal shock, oxidation, and mechanical wear at elevated temperatures. Development of such materials is primarily driven by aerospace and thermal management sectors seeking alternatives to monolithic oxides or nitrides for demanding applications.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | DFT · GLLB-SC | ||
Magnetic Moment(μB) | -1.711 | μB | DFT |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 1.560 | eV/atom | DFT |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data