Tantalum hydride (TaH) is a ceramic compound formed by the incorporation of hydrogen into tantalum metal, creating a refractory material with potential high-temperature and wear-resistant properties. This compound remains largely experimental in scope, with research focused on understanding its structural stability, mechanical behavior, and potential roles in extreme-environment applications where conventional refractory ceramics or pure tantalum may be inadequate. Engineers considering TaH should recognize it as an emerging material in the refractory and advanced ceramics family rather than an established industrial standard, making it relevant primarily for R&D initiatives in high-temperature structural applications.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Density(ρ) | 14.02 | kg/m³ | DFT · OptB88vdW |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | DFT · OptB88vdW | ||
Magnetic Moment(μB) | 0.000 | µB | DFT · OptB88vdW |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Energy Above Hull(ΔEhull) | 0.7391 | eV/atom | DFT · OptB88vdW | ||
Formation Energy(ΔHf) | 0.6310 | eV/atom | DFT · OptB88vdW |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data