Tantalum chloride (TaCl) is an inorganic ceramic compound based on tantalum and chlorine, typically encountered as an intermediate or precursor material rather than a final engineering component. While tantalum itself is valued in electronics and aerospace for its corrosion resistance and high melting point, tantalum chloride derivatives are primarily used in chemical vapor deposition (CVD) processes, thin-film coating applications, and as starting materials for synthesizing advanced tantalum-based ceramics and composites. Engineers would select tantalum chloride precursors when high-purity tantalum coatings or specialized refractory materials are required in demanding environments such as semiconductor processing, high-temperature thermal barriers, or specialty catalyst applications.
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| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Density(ρ) | 11.03 | kg/m³ | DFT · OptB88vdW |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | DFT · OptB88vdW | ||
Magnetic Moment(μB) | 0.000 | µB | DFT · OptB88vdW |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Energy Above Hull(ΔEhull) | 1.658 | eV/atom | DFT · OptB88vdW | ||
Formation Energy(ΔHf) | 0.8131 | eV/atom | DFT · OptB88vdW |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data