TaCl3

ceramic

· TaCl3

Tantalum trichloride (TaCl3) is a halide ceramic compound of tantalum and chlorine, primarily encountered as a precursor material and intermediate chemical rather than a final-form engineering ceramic. It is used in chemical vapor deposition (CVD) and metallurgical synthesis to produce high-purity tantalum coatings, tantalum carbides, and tantalum-based ceramics; it also serves as a starting material in laboratory and industrial synthesis of specialized tantalum compounds. As a reactive halide, TaCl3 is notable for enabling precise, controlled deposition of tantalum at lower temperatures than some alternative precursors, making it valuable in microelectronics and advanced ceramics manufacturing where chemical purity and coating uniformity are critical.

CVD precursor for tantalum coatingsMicroelectronics and thin-film synthesisTantalum carbide productionMetallurgical intermediateHigh-temperature ceramic synthesisResearch and specialty chemical manufacturing

Compliance & Regulations

?Conflict Free?RoHS?REACH?TSCA?Prop 65

Units:

si imperial

Property	Value	Unit	Conditions	Source
Formation Energy(ΔHf)	-1.431	eV/atom	—

Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.

TaCl3

Other Properties

Regulatory Screening

Environmental