Ta₂F₁₀ is a tantalum fluoride ceramic compound belonging to the family of metal fluorides, which are known for their chemical stability and low density. This material is primarily of research and developmental interest rather than established industrial production, with potential applications in corrosive chemical environments, fluorine-based processing, and specialized optical or electronic components where tantalum's refractory nature combined with fluoride chemistry offers advantages. Tantalum fluorides are notably resistant to aggressive fluorinating agents and hydrofluoric acid, making them candidates for containing or processing highly reactive fluorine chemistry where conventional ceramics or metals would degrade.
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| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 4.302 | eV | DFT · OptB88vdW |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -3.074 | eV/atom | DFT · OptB88vdW |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data