Ta1 Ru3
semiconductorTa1Ru3 is an intermetallic compound composed of tantalum and ruthenium in a 1:3 atomic ratio, representing a refractory metal-based system investigated primarily in materials research rather than established commercial production. This compound falls within the tantalum-ruthenium phase diagram and is of interest for high-temperature applications, catalysis research, and specialty electronics where the combined properties of these noble refractory metals may offer corrosion resistance and thermal stability advantages. The material remains largely experimental; its development is driven by academic and industrial research into advanced refractory alloys for extreme-environment applications where conventional superalloys reach their limits.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | — | eV | — | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | — | eV/atom | — | — |