SiSiOFN

semiconductor

· SiSiOFN

SiSiOFN is an experimental silicon oxynitride fluoride compound—a mixed-anion ceramic material combining silicon, oxygen, nitrogen, and fluorine phases. This research material belongs to the advanced nitride/oxynitride family and is primarily explored in academic and industrial R&D settings for high-temperature structural applications and optical/electrical device components where fluorine doping can modify thermal, mechanical, or electronic properties compared to conventional silicon nitride or oxynitride alternatives.

high-temperature ceramics researchadvanced nitride compositesoptical device coatingssemiconductor interlayersthermal barrier material developmentexperimental electronics/photonics

Compliance & Regulations

?EAR?Conflict Free?RoHS?REACH?TSCA?Prop 65

Units:

si imperial

Property	Value	Unit	Conditions	Source
Band Gap(Eg)	1.900	eV	—
Magnetic Moment(μB)	5.523e-15	μB	—

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Formation Energy(ΔHf)	1.180	eV/atom	—

Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

Export Control

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.

SiSiOFN

Electrical Properties

Other Properties

Regulatory Screening

Environmental

Export Control