Silicon oxynitride (SiSiO₂N) is an advanced ceramic compound combining silicon, oxygen, and nitrogen phases, typically formed through controlled oxidation and nitridation of silicon or silicon-based precursors. This material family is primarily investigated for high-temperature structural applications and wear-resistant coatings, where the mixed oxide-nitride composition provides enhanced thermal stability, mechanical strength, and oxidation resistance compared to pure silicon nitride or silica. SiSiO₂N remains largely in the research and development phase but shows promise in aerospace, automotive, and tooling industries where extreme thermal cycling and chemical durability are critical.
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| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | DFT · GLLB-SC | ||
Magnetic Moment(μB) | -0.2871 | μB | DFT |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 1.040 | eV/atom | DFT |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data