Silicon monoxide (SiO) is a non-stoichiometric ceramic compound that exists in a substoichiometric state between pure silicon and silicon dioxide, combining both metallic and ceramic characteristics. It is primarily used in thin-film applications, optical coatings, and semiconductor device processing where its unique electronic and optical properties provide advantages over fully oxidized silica. SiO is notable in vacuum deposition and microelectronics manufacturing for its ability to serve as a moisture barrier, antireflection coating, or intermediate layer, and has research interest in advanced optics and emerging semiconductor technologies where its partial oxidation state enables property tuning unavailable with conventional SiO₂.
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| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Bulk Modulus(K) | 3,670.9 | ksi | DFT · OptB88vdW | ||
Poisson's Ratio(ν) | 0.4000 | - | DFT · OptB88vdW | ||
Shear Modulus(G) | 1,547.6 | ksi | DFT · OptB88vdW |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Density(ρ) | 0.09364 | lb/in³ | DFT · OptB88vdW |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg)2 entries | 0.000 | eV | DFT · OptB88vdW | ||
| ↳ | 0.7920 | eV | DFT · TBmBJ | ||
Dielectric Constant (Relative Permittivity)(εr) | 33.88 | - | DFT · OptB88vdW | ||
High-Frequency Dielectric Constant (ε∞)(ε∞) | 5.086 | - | DFT · TBmBJ | ||
Magnetic Moment(μB) | 0.000 | µB | DFT · OptB88vdW | ||
Piezoelectric Modulus(eij) | 0.1001 | C/m² | DFT · OptB88vdW | ||
Thermoelectric Power Factor(PF)2 entries | 0.000781 | W/(m·K²) | DFT · OptB88vdW · n-type · 1e20 cm⁻³ · 327°C | ||
| ↳ | 0.000447 | W/(m·K²) | DFT · OptB88vdW · p-type · 1e20 cm⁻³ · 327°C | ||
Seebeck Coefficient(S)2 entries | -81.83 | μV/K | DFT · OptB88vdW · n-type · 1e20 cm⁻³ · 327°C | ||
| ↳ | 68.95 | μV/K | DFT · OptB88vdW · p-type · 1e20 cm⁻³ · 327°C | ||
Spectroscopic Limited Maximum Efficiency (SLME)(SLME) | 26.21 | % | DFT · TBmBJ |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Energy Above Hull(ΔEhull) | 0.3572 | eV/atom | DFT · OptB88vdW | ||
Formation Energy(ΔHf) | -1.820 | eV/atom | DFT · OptB88vdW |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data