SiInO₂N is an experimental oxynitride ceramic compound combining silicon, indium, oxygen, and nitrogen—a material class primarily explored in research settings for advanced semiconductor and high-temperature applications. While not yet established in mainstream production, oxynitride ceramics of this family are investigated for potential use in optoelectronic devices, high-temperature structural components, and solid-state lighting due to their tunable bandgap and thermal stability. The indium-containing oxynitride composition represents an emerging alternative to conventional nitride and oxide ceramics, offering potential advantages in properties like thermal conductivity and refractive index, though commercial viability and manufacturing scalability remain under development.
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| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | DFT · GLLB-SC | ||
Magnetic Moment(μB) | 1.945 | μB | DFT |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 2.300 | eV/atom | DFT |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data