SiHfO2F is a hafnium-silicon oxide fluoride ceramic compound combining hafnium oxide with silicon oxide and fluorine—a composition that suggests tailoring for high-temperature stability and chemical resistance. This material family is primarily explored in research contexts for advanced thermal barrier coatings, refractory applications, and optical components where the synergistic properties of hafnium and silicon oxides offer enhanced durability at elevated temperatures compared to single-oxide systems. The fluorine incorporation may provide improved thermal shock resistance or modified surface chemistry, making it relevant for next-generation aerospace and high-heat environments.
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| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | DFT · GLLB-SC | ||
Magnetic Moment(μB) | 9.017e-16 | μB | DFT |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 0.9400 | eV/atom | DFT |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data