SiCl3 (silicon trichloride) is a silicon-based ceramic precursor compound commonly used in chemical vapor deposition (CVD) and sol-gel processing to synthesize silicon carbide and silica-based ceramics. In industrial practice, it serves primarily as a reactive intermediate for manufacturing high-performance ceramic coatings, fibers, and monolithic components rather than as a structural material itself. Engineers select SiCl3 precursors when tight control over ceramic microstructure and composition is critical, or when cost-effective synthesis of complex ceramic geometries is needed compared to direct sintering of powders.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Density(ρ) | 2.200 | kg/m³ | DFT · OptB88vdW |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | DFT · OptB88vdW | ||
Magnetic Moment(μB) | 0.00100 | µB | DFT · OptB88vdW |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Energy Above Hull(ΔEhull) | 0.5329 | eV/atom | DFT · OptB88vdW | ||
Formation Energy(ΔHf) | -0.1909 | eV/atom | DFT · OptB88vdW |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data