OsGaN3 is an experimental ceramic compound combining osmium, gallium, and nitrogen, representing a research-phase material in the wide-bandgap semiconductor and refractory ceramic family. This material is primarily of academic interest for potential high-temperature, high-power electronic applications and advanced optoelectronic devices, though it remains largely in the laboratory development stage rather than established industrial production. The osmium content and gallium nitride (GaN) family connection suggest potential utility in extreme-environment applications, though practical advantages over mature GaN-based or other refractory alternatives are still being evaluated.
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| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | DFT · GLLB-SC | ||
Magnetic Moment(μB) | 0.7520 | μB | DFT |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 1.840 | eV/atom | DFT |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data