O8 K3 Ta1 is a tantalum-containing semiconductor compound with an oxygen-rich composition, likely an oxide-based material combining tantalum with potassium and oxygen phases. This appears to be a research or specialized compound rather than a commodity material, potentially developed for applications requiring tantalum's high refractory properties and chemical inertness combined with semiconductor functionality. The material may be of interest in high-temperature electronics, catalysis, or energy storage applications where tantalum's corrosion resistance and the semiconductor properties of oxide phases provide unique advantages over conventional alternatives.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Bulk Modulus(K) | 5,993.2 | ksi | — | ||
Shear Modulus(G) | 2,952 | ksi | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 3.232 | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -1.613 | eV/atom | — |