This is an experimental mixed-metal oxide semiconductor containing ruthenium, barium, and thulium — a rare-earth-doped compound not yet commercialized for mainstream engineering applications. Such materials are primarily investigated in solid-state physics and materials research for potential optoelectronic, photocatalytic, or high-temperature semiconductor applications where the rare-earth dopant (thulium) may provide unique electronic or magnetic properties. Engineers would consider compounds in this family only in early-stage R&D contexts where novel bandgap engineering, light emission, or catalytic function is being explored, rather than as a drop-in replacement for established semiconductors.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Bulk Modulus(K) | 21,252.8 | ksi | — | ||
Shear Modulus(G) | 12,377.5 | ksi | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 2.691 | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -2.735 | eV/atom | — |