O1 Ta1 is a tantalum-containing semiconductor compound with oxygen in its composition, belonging to the metal oxide or mixed-oxide family of semiconducting materials. This material is primarily of research and development interest for advanced electronic and optoelectronic applications where tantalum's high dielectric constant and chemical stability offer advantages over conventional semiconductors. It may be explored in thin-film devices, high-κ gate dielectrics, or specialized sensing applications where its tantalum content provides superior corrosion resistance and thermal stability compared to standard silicon or oxide alternatives.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.01820 | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -1.083 | eV/atom | — |