KHfO2N is a hafnium-based oxynitride ceramic compound combining hafnium, oxygen, and nitrogen in a fixed stoichiometry. This material belongs to the family of refractory oxynitrides, which are typically investigated for high-temperature structural applications and advanced ceramic coatings where conventional oxides fall short in thermal stability or chemical resistance.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | DFT · GLLB-SC | ||
Magnetic Moment(μB) | 1.999 | μB | DFT |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 0.5600 | eV/atom | DFT |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data