K1 Hf1 Ni1

semiconductor

· K1 Hf1 Ni1

K1 Hf1 Ni1 is a ternary intermetallic compound combining potassium, hafnium, and nickel in equiatomic proportions. This is an experimental material in the high-entropy or complex intermetallic family, with hafnium and nickel components suggesting potential for high-temperature applications and corrosion resistance. Limited commercial deployment exists; this material is primarily of research interest for advanced structural applications where refractory behavior and catalytic properties might be exploited.

high-temperature structural compositescatalysis researchrefractory alloy developmentaerospace material screeningcorrosion-resistant coatingsintermetallic phase studies

Compliance & Regulations

?EAR?Conflict Free?RoHS?REACH?TSCA?Prop 65

Units:

si imperial

Property	Value	Unit	Conditions	Source
Band Gap(Eg)	0.01160	eV	—

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Formation Energy(ΔHf)	1.836	eV/atom	—

Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

Export Control

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.

K1 Hf1 Ni1

Electrical Properties

Other Properties

Regulatory Screening

Environmental

Export Control