InSiOFN

ceramic

· InSiOFN

InSiOFN is an oxynitride ceramic compound combining indium, silicon, oxygen, and nitrogen elements, representing a specialized material in the oxynitride ceramic family. This material is primarily of research and developmental interest for high-temperature structural applications and advanced ceramics, where the nitrogen incorporation into silicate networks can enhance mechanical properties and thermal stability compared to conventional oxide ceramics. InSiOFN and related indium-silicon oxynitrides are being investigated for applications requiring combinations of thermal shock resistance, high-temperature strength, and oxidation resistance in extreme environments.

high-temperature ceramicsaerospace engine componentsthermal barrier coatingsrefractory applicationsadvanced research materialsoxidation-resistant structures

Compliance & Regulations

?Conflict Free?RoHS?REACH?TSCA?Prop 65

Units:

si imperial

Property	Value	Unit	Conditions	Source
Band Gap(Eg)	0.000	eV	—
Magnetic Moment(μB)	6.487e-15	μB	—

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Formation Energy(ΔHf)	0.9000	eV/atom	—

Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.

InSiOFN

Electrical Properties

Other Properties

Regulatory Screening

Environmental