In7 Ge1 Ir1 O8
semiconductorIn₇Ge₁Ir₁O₈ is a mixed-metal oxide semiconductor compound combining indium, germanium, and iridium oxides in a single crystalline phase. This is a research-stage material belonging to the family of complex transition metal oxides, studied for its potential electronic and photocatalytic properties arising from the combination of multiple metal cations with different oxidation states and coordination environments. The material's utility would derive from tailored bandgap engineering and heterogeneous catalytic activity enabled by iridium doping in an indium-germanium oxide matrix, though applications remain primarily in the experimental domain pending demonstration of scalable synthesis and performance advantages over conventional semiconductors.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | — | eV | — | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | — | eV/atom | — | — |