Indium phosphide (InP) is a III-V semiconductor compound widely used in optoelectronic and high-frequency applications. It is valued for its direct bandgap, high electron mobility, and suitability for infrared emission, making it a preferred material where gallium arsenide performance needs to be exceeded or where specific wavelength requirements demand an alternative III-V platform. InP-based devices benefit from mature epitaxial growth techniques and offer superior performance in demanding telecommunications and sensing environments compared to silicon-based alternatives.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Bulk Modulus(K) | 4,858.8 | ksi | — | ||
Shear Modulus(G) | 1,131.3 | ksi | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.09690 | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -1.530 | eV/atom | — |