Ho₂Al₁Os₁ is an experimental intermetallic compound combining holmium (a rare-earth element), aluminum, and osmium, classified as a semiconductor. This ternary composition represents early-stage materials research rather than an established industrial material, with potential applications in high-temperature electronics or specialized magnetic devices given holmium's rare-earth properties and osmium's exceptional hardness and corrosion resistance. Engineers would evaluate this material primarily for niche research contexts requiring rare-earth semiconducting behavior, though practical production scale and cost-effectiveness relative to conventional alternatives remain undetermined.
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| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Bulk Modulus(K) | 15,122.7 | ksi | — | ||
Shear Modulus(G) | 5,723.2 | ksi | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.00460 | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -0.3770 | eV/atom | — |