HfZrO2F
ceramic· HfZrO2F
HfZrO2F is a fluorine-doped mixed oxide ceramic based on hafnium and zirconium oxides, representing a research-phase material in the family of high-k dielectric oxides. This composition combines the thermal stability and high refractive index of hafnia-zirconia systems with fluorine doping to modify phase structure, defect chemistry, and dielectric properties—making it of particular interest for advanced electronic and optical applications where conventional single-component oxides fall short. The material is notable for potential use in next-generation capacitors, gate dielectrics, and optical coatings where the dopant tailors grain boundary behavior and reduces leakage current compared to undoped alternatives.
high-k gate dielectricsthin-film capacitorsoptical coatingsmicroelectronicsresearch / emerging materialsthermal barrier applications
Compliance & Regulations
?ISO 10993?Conflict Free?RoHS?REACH?TSCA?Prop 65
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | — | eV | — | — | |
Magnetic Moment(μB) | — | μB | — | — |
Verified Unverified Low confidence (<80%) Link to source
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | — | eV/atom | — | — |
Verified Unverified Low confidence (<80%) Link to source
Regulatory Screening
Environmental
Safety & Biocompatibility
RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.