HfZnO2 is a ternary oxide ceramic compound combining hafnium and zinc oxides, representing an emerging material in the functional ceramics family. While primarily a research-phase material, it is being investigated for applications requiring high thermal stability, electrical functionality, or optical properties—particularly in thin-film and semiconductor contexts where the combined properties of hafnium oxide's robustness and zinc oxide's semiconducting characteristics offer potential advantages over single-phase alternatives.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Density(ρ) | 0.3781 | lb/in³ | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | — | ||
Magnetic Moment(μB) | 0.000 | µB | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Energy Above Hull(ΔEhull) | 0.9660 | eV/atom | — | ||
Formation Energy(ΔHf) | -1.891 | eV/atom | — |