HfTlO2N

ceramic

· HfTlO2N

HfTlO₂N is an experimental oxynitride ceramic containing hafnium, thallium, and nitrogen, belonging to the family of advanced refractory ceramics and high-entropy oxide compounds. This material is primarily investigated in research settings for high-temperature structural applications and electronic device development, where its mixed-valence composition and nitrogen incorporation offer potential advantages in thermal stability, hardness, and electrical properties compared to conventional binary oxides.

high-temperature refractory applicationsadvanced ceramics researchsemiconductor device layersthermal barrier coatings (experimental)dense functional ceramics

Compliance & Regulations

?Conflict Free?RoHS?REACH?TSCA?Prop 65

Units:

si imperial

Property	Value	Unit	Conditions	Source
Band Gap(Eg)	0.000	eV	—
Magnetic Moment(μB)	-0.00124	μB	—

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Formation Energy(ΔHf)	2.460	eV/atom	—

Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.

HfTlO2N

Electrical Properties

Other Properties

Regulatory Screening

Environmental