HfSnO2N is an oxynitride ceramic compound combining hafnium, tin, oxygen, and nitrogen, belonging to the family of advanced refractory and functional ceramics. This material is primarily of research interest for high-temperature applications and semiconductor/dielectric applications where improved thermal stability and hardness compared to binary oxides are sought. The oxynitride composition offers potential advantages in thermal barrier coatings, wear-resistant surfaces, and advanced gate dielectrics, though commercial adoption remains limited and material characterization is ongoing in the materials science literature.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | DFT · GLLB-SC | ||
Magnetic Moment(μB) | -0.2014 | μB | DFT |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 1.120 | eV/atom | DFT |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data