HfSnO2N

ceramic

· HfSnO2N

HfSnO2N is an oxynitride ceramic compound combining hafnium, tin, oxygen, and nitrogen, belonging to the family of advanced refractory and functional ceramics. This material is primarily of research interest for high-temperature applications and semiconductor/dielectric applications where improved thermal stability and hardness compared to binary oxides are sought. The oxynitride composition offers potential advantages in thermal barrier coatings, wear-resistant surfaces, and advanced gate dielectrics, though commercial adoption remains limited and material characterization is ongoing in the materials science literature.

thermal barrier coatingshigh-temperature refractory applicationswear-resistant ceramicsadvanced dielectricsresearch/development materialsextreme environment components

Compliance & Regulations

?Conflict Free?RoHS?REACH?TSCA?Prop 65

Units:

si imperial

Property	Value	Unit	Conditions	Source
Band Gap(Eg)	0.000	eV	—
Magnetic Moment(μB)	-0.2014	μB	—

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Formation Energy(ΔHf)	1.120	eV/atom	—

Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.

HfSnO2N

Electrical Properties

Other Properties

Regulatory Screening

Environmental