HfSiON2

ceramic
· HfSiON2

HfSiON2 is an advanced oxynitride ceramic compound combining hafnium, silicon, oxygen, and nitrogen phases, typically developed as a thin-film or bulk ceramic material for high-temperature and harsh-environment applications. This material family is primarily of research and developmental interest, explored for use in thermal barrier coatings, oxidation-resistant surface layers, and next-generation electronic device applications where hafnium-based ceramics offer superior thermal stability and chemical resistance compared to conventional silicates. Engineers consider hafnium oxynitrides when standard oxides prove insufficient at extreme temperatures or in corrosive environments, particularly in aerospace, power generation, and semiconductor processing contexts.

thermal barrier coatingshigh-temperature oxidation resistancesemiconductor device protectionturbine engine componentsharsh environment surface protectionadvanced refractory applications

Compliance & Regulations

?Conflict Free?RoHS?REACH?TSCA?Prop 65
Units:
siimperial
PropertyValueUnitConditionsSource
Band Gap(Eg)
—
eV——
Magnetic Moment(μB)
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μB——
Verified Unverified Low confidence (<80%) Link to source
PropertyValueUnitConditionsSource
Formation Energy(ΔHf)
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eV/atom——
Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.