HfOs₃ is a ternary ceramic compound combining hafnium and osmium oxides, belonging to the refractory oxide ceramic family. This material is primarily of research interest rather than established commercial production, studied for its potential as an ultra-high-temperature ceramic and in advanced oxidation-resistant coating applications. Its notable density and refractory character make it a candidate for extreme thermal environments, though hafnium-osmium systems remain limited in industrial deployment compared to more conventional refractory oxides.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Density(ρ) | 0.7109 | lb/in³ | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | — | ||
Magnetic Moment(μB) | 0.000 | µB | — | ||
Seebeck Coefficient(S) | 0.2700 | µV/K | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Energy Above Hull(ΔEhull) | 0.2371 | eV/atom | — | ||
Formation Energy(ΔHf) | -0.1484 | eV/atom | — |