HfOs2
ceramic· HfOs2
Hafnium oxide (HfO₂) is a high-k ceramic compound widely used as a gate dielectric in advanced semiconductor devices, where it replaces traditional silicon dioxide to enable continued transistor scaling below 28 nm process nodes. It is also employed in optical coatings, thermal barrier applications, and nuclear fuel cladding due to its high melting point, chemical stability, and radiation resistance. Engineers select HfO₂ over alternatives like SiO₂ when higher dielectric constant and greater physical thickness (for equivalent capacitance) are needed to reduce gate leakage current while maintaining electrostatic control in nanoscale CMOS and emerging memory technologies.
semiconductor gate dielectricsadvanced CMOS logicmemory devices (DRAM, flash)optical thin filmsthermal barriersnuclear fuel cladding
Compliance & Regulations
?Conflict Free?RoHS?REACH?TSCA?Prop 65
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Bulk Modulus(K)2 entries | — | Pa | — | — | |
| ↳ | — | Pa | — | — | |
Elastic Compliance Tensor(Sij) | Matrix (redacted) | 1/GPa | — | — | |
Elastic Anisotropy(AU) | — | - | — | — | |
Elastic Stiffness Tensor(Cij) | Matrix (redacted) | Pa | — | — | |
Poisson's Ratio(ν) | — | - | — | — | |
Shear Modulus(G)2 entries | — | Pa | — | — | |
| ↳ | — | Pa | — | — |
N entriesMultiple entries per property — large groups are collapsed; click a summary row to expand. Use filters above to narrow by form / heat treatment / basis.
Verified Unverified Low confidence (<80%) Link to source
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Density(ρ) | — | kg/m³ | — | — |
Verified Unverified Low confidence (<80%) Link to source
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg)2 entries | — | eV | — | — | |
| ↳ | — | eV | — | — | |
Magnetic Moment(μB) | — | µB | — | — |
N entriesMultiple entries per property — large groups are collapsed; click a summary row to expand. Use filters above to narrow by form / heat treatment / basis.
Verified Unverified Low confidence (<80%) Link to source
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Energy Above Hull(ΔEhull) | — | eV/atom | — | — | |
Formation Energy(ΔHf) | — | eV/atom | — | — |
Verified Unverified Low confidence (<80%) Link to source
Regulatory Screening
Environmental
RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.