HfO3

ceramic
· JVASP-118535· HfO3

Hafnium trioxide (HfO₂) is a high-performance ceramic oxide compound belonging to the refractory oxide family, valued for its exceptional thermal stability and chemical inertness at extreme temperatures. It is primarily used in advanced semiconductor applications as a high-k dielectric gate material in transistor technology, thermal barrier coatings for aerospace engines, and nuclear fuel cladding systems where superior corrosion resistance and radiation tolerance are critical. Engineers select HfO₂ over traditional silica-based ceramics when operation exceeds 1000°C or when dimensional stability and resistance to aggressive chemical environments are non-negotiable.

semiconductor gate dielectricsthermal barrier coatingsnuclear fuel claddinghigh-temperature refractoriesoptical coatings and waveguidescrucibles for molten metal containment

Compliance & Regulations

?Conflict Free?RoHS?REACH?TSCA?Prop 65
PropertyValueUnitConditionsSource
Bulk Modulus(K)
ksi
Poisson's Ratio(ν)
-
Shear Modulus(G)
ksi
Verified Unverified Low confidence (<80%) Link to source
PropertyValueUnitConditionsSource
Density(ρ)
lb/in³
Verified Unverified Low confidence (<80%) Link to source
PropertyValueUnitConditionsSource
Band Gap(Eg)
eV
Magnetic Moment(μB)
µB
Verified Unverified Low confidence (<80%) Link to source
PropertyValueUnitConditionsSource
Energy Above Hull(ΔEhull)
eV/atom
Formation Energy(ΔHf)
eV/atom
Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.