HfLiO2N

ceramic

· HfLiO2N

HfLiO₂N is an experimental oxynitride ceramic compound containing hafnium, lithium, oxygen, and nitrogen. This material belongs to the class of advanced ceramic oxynitrides, which are primarily investigated in research settings for high-temperature applications and as potential dielectric or structural materials. The combination of hafnium's refractory properties with nitrogen incorporation offers potential for enhanced thermal stability and hardness compared to conventional oxides, though this composition remains largely in development and lacks widespread industrial deployment.

high-temperature ceramics (research)advanced dielectrics (experimental)refractory compoundsthin-film coatings (development)ceramic composite constituentsmaterials research applications

Compliance & Regulations

?Conflict Free?RoHS?REACH?TSCA?Prop 65

Units:

si imperial

Property	Value	Unit	Conditions	Source
Band Gap(Eg)	0.000	eV	—
Magnetic Moment(μB)	1.720	μB	—

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Formation Energy(ΔHf)	1.520	eV/atom	—

Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.

HfLiO2N

Electrical Properties

Other Properties

Regulatory Screening

Environmental