HfLaO3

ceramic

· HfLaO3

HfLaO3 is a hafnium-lanthanum oxide ceramic compound that combines the high-κ dielectric properties of hafnium oxide with the thermal and chemical stability of lanthanum oxide. This material is primarily investigated for advanced semiconductor applications where conventional gate dielectrics reach performance limits, and represents an important class of rare-earth doped high-κ oxides being developed to extend device scaling in microelectronics.

advanced semiconductor gate dielectricsCMOS scaling and nanoelectronicshigh-κ dielectric thin filmsresearch and development

Compliance & Regulations

?Conflict Free?RoHS?REACH?TSCA?Prop 65

Units:

si imperial

Property	Value	Unit	Conditions
Band Gap(Eg)	0.000	eV	—
Magnetic Moment(μB)2 entries	0.000	μB	—
↳	0.2901	μB	—

N entriesMultiple entries per property — large groups are collapsed; click a summary row to expand. Use filters above to narrow by form, heat treatment, basis, or test environment.

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Formation Energy(ΔHf)2 entries	-3.262	eV/atom	—
↳	1.000	eV/atom	—

N entriesMultiple entries per property — large groups are collapsed; click a summary row to expand. Use filters above to narrow by form, heat treatment, basis, or test environment.

Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.

HfLaO3

Electrical Properties

Other Properties

Regulatory Screening

Environmental