HfGaN3 is a hafnium gallium nitride ceramic compound that combines the refractory properties of hafnium with the wide bandgap semiconductor characteristics of gallium nitride. This material exists primarily in research and early-stage development contexts, where it is being investigated for extreme-temperature and high-power-density applications that demand superior thermal stability and electrical performance beyond conventional GaN or AlN ceramics.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | — | ||
Magnetic Moment(μB) | 1.089 | μB | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 1.520 | eV/atom | — |