HfCl3

ceramic
· JVASP-115081· HfCl3

Hafnium trichloride (HfCl₃) is an inorganic ceramic compound and halide salt of hafnium, primarily used as a precursor material in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes rather than as a structural ceramic. It serves as a volatile, transportable source of hafnium for depositing high-performance oxide and nitride thin films in semiconductor manufacturing, microelectronics, and advanced coatings. Engineers select HfCl₃ over alternative hafnium precursors due to its favorable volatility and decomposition characteristics, making it particularly valuable for creating high-κ dielectric films, barrier layers, and refractory coatings in demanding applications where hafnium's thermal stability and chemical resistance are essential.

semiconductor thin-film depositionhigh-κ dielectric layersCVD/ALD precursorthermal barrier coatingsmicroelectronics manufacturingrefractory film synthesis

Compliance & Regulations

?Conflict Free?RoHS?REACH?TSCA?Prop 65
Units:
siimperial
PropertyValueUnitConditionsSource
Bulk Modulus(K)
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Pa——
Shear Modulus(G)
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Pa——
Verified Unverified Low confidence (<80%) Link to source
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Density(ρ)
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kg/m³——
Verified Unverified Low confidence (<80%) Link to source
PropertyValueUnitConditionsSource
Band Gap(Eg)
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eV——
Magnetic Moment(μB)
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µB——
Verified Unverified Low confidence (<80%) Link to source
PropertyValueUnitConditionsSource
Energy Above Hull(ΔEhull)
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eV/atom——
Formation Energy(ΔHf)
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eV/atom——
Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.